The MET Facilities @ Berkeley

"Our goal is to make your experiment and visit the best it can be. Our experienced team of scientists, engineers, technicians, and support staff is here to help you through the entire experimental process, including logistics, designing your experiment, data interpretation, and more. We look forward to working with you."

Patrick Naulleau,
MET Principal Investigator


The Berkeley Microfield Exposure Tool (MET) is the world's highest resolution EUV lithography tool. It is used by researchers from around the world for early learning in key areas such as resists, processing, and masks. The MET’s unique capabilities allow it to reach down to 16-nm patterning and below, giving researchers a clear and unparalleled view into the future of photolithography. To learn more about the MET, visit the Center for X-ray Optics MET page, which is geared towards a more general audience. This specific site is to serve our user community.